Determination of the temperature coefficient of resistance from micro four-point probe measurements

Current characterization methods of the temperature coefficient resistance (TCR) thin films are often limited to slow macroscale measurements, which further require a direct determination temperature. In this work, we present an innovative application micro four-point probe (M4PP) sensing, enables fast, non-destructive, local measurement Joule heating effects that can be translated into TCR film. Analytical expressions for response heating, and ultimately profile during M4PP measurement, derived validated against finite element models. The method is successfully demonstrated on three metal (7, 10, 16 nm platinum deposited fused silica). We evaluate using two different electrode configurations, resulting in unique fields, observe repeatability <2% each configuration. Furthermore, M4PP-TCR shows only minor (?18%) systematic offset relative reference measurements obtained via independent physical property system. Our results demonstrate new technique characterizing micrometer scale, adequately backed by theory. time just few seconds could allow film mapping or in-line process monitoring test structures.